GDSHelpers is an open-source package for automatized pattern generation for nano-structuring.

Github repository to share some insights about lithography simulation.

Differentiable Computational Lithogrpahy Framework

From Qiskit Metal to pattern generation to real nanofabrication demo. Here, quantum devices on a chip are patterned via direct-write electron-beam lithography in a nanofabrication facility. Formed & written by Onri Jay Benally, an Indigenous American quantum hardware engineer.

MATLAB tools for Raith electron-beam lithography (EBL) and focused ion beam (FIB) systems — Outils MATLAB pour les systèmes Raith de lithographie par faisceau d'électrons et de faisceau d'ions focalisés

Generate ASCII Job files for an ASML PAS 5500 Stepper Lithography system, by the UCSB Nanofabrication Facility.

Practical example from the SPIE short course "Data Analytics and Machine Learning in Semiconductor Manufacturing: Applications for Physical Design, Process and Yield Optimization"

Maskless photolithography system targeting 5um resolution. Open hardware design.

MATLAB tools for Raith electron-beam lithography (EBL) and focused ion beam (FIB) systems — Outils MATLAB pour les systèmes Raith de lithographie par faisceau d'électrons et de faisceau d'ions focalisés

We use MixedWM38, the mixed-type wafer defect pattern dataset for wafer defect pattern regcognition with visual transformers.

This is a comprehensive MATLAB-based software platform developed for real-time measurement and feedback control of a custom mask-projection photopolymerization based additive manufacturing system (referred as "ECPL", i.e., Exposure Controlled Projection Lithography) using a lab-built interferometry (referred as "ICM&M", i.e., Interferometric Cur…

Lithography defect prediction for microchip manufacturing optimization with machine learning model

EE6601 Advanced Wafer Processing

MCSC - A semiconductor manufacturing mod for Minecraft (Java)

Desktop app for lithography learning available for Windows, macOS, and Linux

Utilities for performing parallel and simultaneous lithography using an array of self-heating AFM cantilevers

Software used to write conductive nanostructures at the interface of LaAlO3 and SrTiO3

A model that can be plugged into a bigger model by T. Verduin. This model is able to simulate e-beam lithography, and this particular model implements the effect of bondbreaking in PMMA (plastic). This model has been done as part of the Bachelor thesis of Mels Habold for at ImPhys at Delft University of Technology in 2019.

Vector graphics based nanolithography tool for Asylum Research AFMs